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Title 

Nonstick, modulus-tunable and gas-permeable replicas for mold-based, high-resolution nanolithography

Authors 

B K LeeHyeon Min JoBong Hyun Chung

Publisher 

Wiley-VCH Verlag Berlin

Issue Date 

2011

Citation 

Advanced Functional Materials, vol. 21, no. 19, pp. 3681-3689

Keywords 

gas permeabilityhybrid materialsmechanical propertiesnanoimprintingnonstick replica molds

Abstract 

A fundamental approach to fabricating a nonstick replica mold with high performance for the manufacturing of high-resolution nanostructures using mold-based lithography is presented. Low-viscosity liquid blends consisting of methacrylate multi-functionalized silsesquioxane (SSQMA), difunctional acrylics, and a small amount of silicone diacrylate (Si-DA) with low surface tension were used as nonstick replica-mold materials. The cured SSQMA/acrylic/Si-DA networks showed a high resistance to organic solvents (<1.2 wt.%), high UV transparency (>90% at 365 nm), hydrophobicity (water contact angle >90°), high modulus and wide-range modulus tunability (0.6-4.42 GPa) and small shrinkage (<3% in height). The mold materials with a nonstick property conferred by Si-DA possessed the ability to form sub-25-nm features with a high line-to-space ratio (1:1) and a high aspect ratio (4:1). In addition, a sufficiently cured replica mold with a low concentration of residual, uncross-linked (meth)acrylates was able to successfully replicate sub-25-nm features with a high line-to-space ratio (1:1) and a high aspect ratio (4:1), even if the release agent was not modified. Furthermore, replica molds can potentially be used to fabricate patterns free of bubble defects because of sufficient gas permeability.

ISSN 

1616-301X

Link 

http://dx.doi.org/10.1002/adfm.201101278

Appears in Collections

1. Journal Articles > Journal Articles

Registered Date

2019-05-02


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